Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Niobium Ethoxide, Nb(OC2H5)5, Nb(OEt)5, CAS# 3236-82-6

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 3 record(s).

NumberTitle
1Radical Enhanced Atomic Layer Deposition of Metals and Oxides
2Radical Enhanced Atomic Layer Deposition of Metals and Oxides
3Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes