Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Niobium Ethoxide, Nb(OC2H5)5, Nb(OEt)5, CAS# 3236-82-6

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 3 record(s).

NumberTitle
1Radical Enhanced Atomic Layer Deposition of Metals and Oxides
2Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
3Radical Enhanced Atomic Layer Deposition of Metals and Oxides