DiMethoxyDiMethylSilane DMDMS, (CH3)2(OCH3)2Si, CAS# 1112-39-6
Plasma Enhanced Atomic Layer Deposition Film Publications
Your search for publications using this chemistry returned 1 record(s).
| Number | Title |
|---|---|
| 1 | Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition |