Tert-Butylimido,Tris(EthylMethylamino)Tantalum, Ta[N(CH3)(C2H5)]3[=NC(CH3)3], TBTEMT, CAS# 511292-99-2
Plasma Enhanced Atomic Layer Deposition Film Publications
Your search for publications using this chemistry returned 1 record(s).
| Number | Title |
|---|---|
| 1 | Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects |