Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

La(TMHD)3, La(THD)3, tris(2,2,6,6-tetramethyl-3,5-heptanedionato) lanthanum, Lanthanum dipivaloylmethanate, CAS# 14319-13-2

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 2 record(s).

NumberTitle
1Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
2Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition