Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

3DMAP, Tris(DiMethylAmido)Phosphine, (Me2N)3P, CAS# 1608-26-0

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s).

NumberTitle
1Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon