tris(bis[trimethylsilyl]amido) lanthanum, La[N(TMS)₂]₃, CAS# 175923-07-6

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 2 record(s).

Number	Title
1	Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
2	Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition