Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

MABONi, Ni(dmamb)2, bis(dimethylamino-2-methyl-2-butoxo)nickel, CAS# 942311-35-5

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 3 record(s).

NumberTitle
1Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
2Formation of Ni silicide from atomic layer deposited Ni
3Plasma-Enhanced Atomic Layer Deposition of Ni