Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

DIPTe, DiIsoPropylTelluride, Te(iPr)2, CAS# 51112-72-2

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 2 record(s).

NumberTitle
1GeSbTe deposition for the PRAM application
2GeSbTe deposition for the PRAM application