Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

VTIP, vanadium (V) tri-i-propoxy oxide, VO(O-i-Pr)3, CAS# 5588-84-1

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 2 record(s).

NumberTitle
1Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
2Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material