tris(3-hexyne)tungsten(0) carbonyl, CAS# 12131-66-7

Your search for publications using this chemistry returned 4 record(s).

Number	Title
1	Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
2	A controlled growth of WN_x and WC_x thin films prepared by atomic layer deposition
3	A controlled growth of WN_x and WC_x thin films prepared by atomic layer deposition
4	Atomic layer deposition of WN_x thin films using a F-free tungsten metal-organic precursor and NH₃ plasma as a Cu-diffusion barrier