Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Bis(n-propyl tetramethyl cyclopentadienyl) barium, Ba[(n-Pr)(Me)4Cp]2, CAS# 210758-43-3

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 4 record(s).

NumberTitle
1Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
2Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
3Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
4Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films