Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

DMG, Dimethylgermane, Me2GeH2, CAS# 1449-64-5

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 3 record(s).

NumberTitle
1Atomic hydrogen-assisted ALE of germanium
2Atomic layer epitaxy of germanium
3Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium