Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

TDMAGe, (Me2N)4Ge, [(CH3)2N]4Ge, Tetrakis(DiMethylAmido) Germanium, Germanium Dimethylamide, CAS# 7344-40-3

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 5 record(s).

NumberTitle
1Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
2Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
3GeSbTe deposition for the PRAM application
4Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds
5GeSbTe deposition for the PRAM application