Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

La(EtCp)3, tris(ethylcyclopentadienyl) lanthanum, CAS# 404009-15-0

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 2 record(s).

NumberTitle
1Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
2Lanthanum-Oxide Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition