bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum, CAS# 0-0-0
Plasma Enhanced Atomic Layer Deposition Film Publications
Your search for publications using this chemistry returned 1 record(s).
| Number | Title |
|---|---|
| 1 | Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex |