Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

B2H6, Diborane, Boroethane, Boron hydride, Diboron hexahydride, CAS# 19287-45-7

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 2 record(s).

NumberTitle
1Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
2Investigation of Tungsten Nitride Deposition Using Tungsten Hexafluoride Precursor for Via and Plug Metallization