Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Bis(N-t-butyl-N'-ethylpropanimidamidato) cobalt(II), CAS# 1011477-51-2

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 3 record(s).

NumberTitle
1Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
2Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
3Atomic Layer Deposition of the Conductive Delafossite PtCoO2