Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Bis(EthylMethylAmino)Silane, BEMAS, (EtMeN)2SiH2, CAS# 1011514-41-2

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s).

NumberTitle
1Gate Insulator for High Mobility Oxide TFT