Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

TMSb, trimethyl antimony, SbMe3, CAS# 594-10-5

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s).

NumberTitle
1Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon