TASn, TetraAllylTin, (H₂C=CHCH₂)₂Sn, CAS# 7393-43-3

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s).

Number	Title
1	Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization