TASn, TetraAllylTin, (H2C=CHCH2)2Sn, CAS# 7393-43-3
Plasma Enhanced Atomic Layer Deposition Film Publications
Your search for publications using this chemistry returned 1 record(s).
| Number | Title |
|---|---|
| 1 | Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization |