Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

TaCl5, Tantalum Pentachloride, CAS# 7721-01-9

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 9 record(s).

NumberTitle
1The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
2The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
3Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
4Radical Enhanced Atomic Layer Deposition of Metals and Oxides
5Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
6Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
7Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
8Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
9The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties