Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Disilane, Si2H6, CAS# 1590-87-0

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 4 record(s).

NumberTitle
1Electron-enhanced atomic layer deposition of silicon thin films at room temperature
2Si atomic layer epitaxy based on Si2H6 and remote He plasma bombardment
3Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
4Atomic Layer Epitaxy of Group IV Materials: Surface Processes, Thin Films, Devices and Their Characterization