Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

(EtCp)2ScCl, Bis(ethylcyclopentadienyl)scandium chloride, CAS# 2845240-61-9

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s).

NumberTitle
1Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride