bis(isopropoxidedimethylamido)nickel, Ni(Oi-PrN(CH3)2)2, CAS# 0-0-0
Plasma Enhanced Atomic Layer Deposition Film Publications
Your search for publications using this chemistry returned 2 record(s).
| Number | Title |
|---|---|
| 1 | Radical Enhanced Atomic Layer Deposition of Metals and Oxides |
| 2 | Radical Enhanced Atomic Layer Deposition of Metals and Oxides |