Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

VO(acac)2, VO(pd)2, Vanadyl acetylacetonate, oxobis(2,4-pentanedionato)vanadium(IV), CAS# 3153-26-2

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s).

NumberTitle
1Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5