HfTB, Hf[OC(Me)₃]₄, Hf[OC(CH₃)₃]₄, Hafnium tetra-tert-butoxide, CAS# 2172-02-3

Your search for publications using this chemistry returned 3 record(s).

Number	Title
1	Plasma enhanced atomic layer deposition of HfO₂ and ZrO₂ high-k thin films
2	Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
3	Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition

HfTB, Hf[OC(Me)3]4, Hf[OC(CH3)3]4, Hafnium tetra-tert-butoxide, CAS# 2172-02-3