Diiodosilane, H₂I₂Si, CAS# 13760-02-6

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 2 record(s).

Number	Title
1	Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
2	Effect of rapid thermal annealing on the mechanical stress and physico-chemical properties in plasma enhanced atomic layer deposited silicon nitride thin films