Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Ga(TMHD)3, Ga(THD)3, tris(2,2,6,6-tetramethyl- 3,5-heptanedionato) gallium, Gallium tetramethylheptanedionate, CAS# 34228-15-4

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s).

NumberTitle
1Plasma enhanced atomic layer deposition of Ga2O3 thin films