Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Te2(n-C4H9)2, Dibutyl ditelluride, CAS# 77129-69-2

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s).

NumberTitle
1Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds