Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Bis(N,N'-diisopropylacetamidinato)cobalt, CAS# 635680-58-9

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 2 record(s).

NumberTitle
1Plasma enhanced atomic layer deposition of cobalt nitride with cobalt amidinate
2Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt