Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Bis(dimethylamino) [(methylaminodimethylsilyl) methylcyclopentadienyl] hafnium(IV), (DNSHf, Hf[η51-Cp(CH2 ) (SiMe2)NMe](NMe2)2, CAS# 0-0-0

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s).

NumberTitle
1Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor