TEMAV, (EtMeN)₄V, [(C₂H₅)(CH₃)N]₄V, Tetrakis(EthylMethylAmido) Vanadium, Vanadium Ethylmethylamide, CAS# 791114-66-4

Your search for publications using this chemistry returned 3 record(s).

Number	Title
1	Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
2	Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
3	Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material

TEMAV, (EtMeN)4V, [(C2H5)(CH3)N]4V, Tetrakis(EthylMethylAmido) Vanadium, Vanadium Ethylmethylamide, CAS# 791114-66-4