Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

CSN-2, 1,3-di-isopropylamino -2,4-dimethylcyclosilazane, CAS# 0-0-0

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s).

NumberTitle
1Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma