Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Tetraethyl Tin, Tetraethyltin, Et4Sn, (CH3CH2)4Sn, (C2H5)4Sn, CAS# 597-64-8

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 2 record(s).

NumberTitle
1Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
2Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries