Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Tris(dimethylamino)chlorosilane, 3DMASiCl, CAS# 13307-05-6

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s).

NumberTitle
1Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition