Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

B(OMe)3, Trimethyl borate, Boric acid trimethyl ester, Methyl borate, CAS# 121-43-7

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 2 record(s).

NumberTitle
1Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
2Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process