Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

DMDCS, Dimethyldichlorosilane, Si(CH3)2Cl2, CAS# 75-78-5

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s).

NumberTitle
1Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics