Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Di(Tert-Butyl)Telluride, But2Te, CAS# 83817-35-0

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 2 record(s).

NumberTitle
1Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
2Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon