TMS, trimethylsilane, Me₃SiH, CAS# 993-07-7

Your search for publications using this chemistry returned 2 record(s).

Number	Title
1	Characteristics of SiOC(-H) Thin Films Prepared by Using Plasma-enhanced Atomic Layer Deposition
2	Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition

TMS, trimethylsilane, Me3SiH, CAS# 993-07-7