Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Tris(DiMethylAmido)Antimony, Sb[(CH3)2N]3, TDMASb, CAS# 7289-92-1

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 5 record(s).

NumberTitle
1Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
2GeSbTe deposition for the PRAM application
3GeSbTe deposition for the PRAM application
4Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
5Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon