Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

DEB, DiEthylBeryllium, BeEt2, Be(C2H5)2, CAS# 542-63-2

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 2 record(s).

NumberTitle
1Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
2Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition