Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Molybdenum(V) chloride, [MoCl5]2, CAS# 10241-05-1

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s).

NumberTitle
1Radical Enhanced Atomic Layer Deposition of Metals and Oxides