Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Gd(i-PrCp)3, CAS# 126970-21-6

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s).

NumberTitle
1Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide