Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

NbCl5, Niobium(V) chloride, Niobium pentachloride, CAS# 10026-12-7

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 2 record(s).

NumberTitle
1Atomic Layer Deposition of Niobium Nitride from Different Precursors
2Tribological properties of thin films made by atomic layer deposition sliding against silicon