copper(I)-N,N'-diisopropylacetamidinate, (Cu(amd)), CAS# 0-0-0
Plasma Enhanced Atomic Layer Deposition Film Publications
Your search for publications using this chemistry returned 1 record(s).
| Number | Title |
|---|---|
| 1 | Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma |