Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Diaminosilane, SiH2(NH2)2, CAS# 0-0-0

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 3 record(s).

NumberTitle
1On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
2Symmetrical Al2O3-based passivation layers for p- and n-type silicon
3Trapped charge densities in Al2O3-based silicon surface passivation layers