Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Bis(ethylcyclopentadienyl)hafnium(IV) dichloride, Hf(C2H5C5H4)2Cl2, Hf(EtCp)2Cl2, CAS# 78205-93-3

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s).

NumberTitle
1Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2