Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Alane N,N-dimethylethylamine, (CH3)2(C2H5)N:AlH3, DMEAA, CAS# 124330-23-0

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s).

NumberTitle
1Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition