TEOS, Si(OC₂H₅)₄, TetraEthyl OrthoSilicate, CAS# 78-10-4

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 7 record(s).

Number	Title
1	Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
2	Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
3	Optical and Electrical Properties of TixSi1-xOy Films
4	Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
5	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
6	Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
7	Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition