Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Tin(IV) t-butoxide, Sn(OtBu)4, Sn(OC4H9)4, CAS# 36809-75-3

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s).

NumberTitle
1Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries